Difference between revisions of "Nanoskiving: A New Method to Produce Arrays of Nanostructures"

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'''Journal:''' Accounts of chemical research, December 2008, Vol. 41, No. 12
 
'''Journal:''' Accounts of chemical research, December 2008, Vol. 41, No. 12
 +
  
 
'''Summary'''
 
'''Summary'''
  
 
Nanoskiving is a novel fabrication technique which combines the deposition of thin films on a master substrate, with sectioning using ultramicrotome. By this technique, one can create a pre-defined, freestanding nanostructures on nonplanar surfaces, which is challenging for the conventional top-down techniques, such as photolithography and e-beam lithography, with the limitations of cost, availability, and material constraints.
 
Nanoskiving is a novel fabrication technique which combines the deposition of thin films on a master substrate, with sectioning using ultramicrotome. By this technique, one can create a pre-defined, freestanding nanostructures on nonplanar surfaces, which is challenging for the conventional top-down techniques, such as photolithography and e-beam lithography, with the limitations of cost, availability, and material constraints.

Revision as of 04:13, 12 September 2011

Entry by Pichet Adstamongkonkul, AP 225, Fall 2011

Reference:

Title: Nanoskiving: A New Method to Produce Arrays of Nanostructures

Authors: Q. Xu, R. M. Rioux, M. D. Dickey, G. M. Whitesides

Journal: Accounts of chemical research, December 2008, Vol. 41, No. 12


Summary

Nanoskiving is a novel fabrication technique which combines the deposition of thin films on a master substrate, with sectioning using ultramicrotome. By this technique, one can create a pre-defined, freestanding nanostructures on nonplanar surfaces, which is challenging for the conventional top-down techniques, such as photolithography and e-beam lithography, with the limitations of cost, availability, and material constraints.