Nanometer patterning with ice
Written by: Grant England AP225 Fall, 2011
Title: Nanometer Patterning with Ice
Authors: King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko
This paper detailed the use of water ice as a photolithographic material akin to photoresist. By growing layers of ice on a substrate, and using e-beam or FIB to sublimate parts of the ice off, the authors were able to achieve very high (though not record-breaking) resolution for metal features deposited on the substrate.