Nanometer patterning with ice

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Written by: Grant England AP225 Fall, 2011


Title: Nanometer Patterning with Ice

Authors: King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko



This paper detailed the use of water ice as a photolithographic material akin to photoresist. By growing layers of ice on a substrate, and using e-beam or FIB to sublimate parts of the ice off, the authors were able to achieve very high (though not record-breaking) resolution for metal features deposited on the substrate.

Methods and Results

Conclusions and Link to Soft Matter