Difference between revisions of "Nanometer patterning with ice"

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==Summary==
 
==Summary==
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This paper detailed the use of water ice as a photolithographic material akin to photoresist.  By growing layers of ice on a substrate, and using e-beam or FIB to sublimate parts of the ice off, the authors were able to achieve very high (though not record-breaking) resolution for metal features deposited on the substrate.
  
 
==Methods and Results==
 
==Methods and Results==

Revision as of 00:55, 19 September 2011

Written by: Grant England AP225 Fall, 2011

Info

Title: Nanometer Patterning with Ice

Authors: King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko

@Harvard: http://dash.harvard.edu/bitstream/handle/1/3109370/Branton_NanometerPatterning.pdf?sequence=1

Summary

This paper detailed the use of water ice as a photolithographic material akin to photoresist. By growing layers of ice on a substrate, and using e-beam or FIB to sublimate parts of the ice off, the authors were able to achieve very high (though not record-breaking) resolution for metal features deposited on the substrate.

Methods and Results

Conclusions and Link to Soft Matter