Difference between revisions of "Nanometer patterning with ice"
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==Summary== | ==Summary== | ||
| + | This paper detailed the use of water ice as a photolithographic material akin to photoresist. By growing layers of ice on a substrate, and using e-beam or FIB to sublimate parts of the ice off, the authors were able to achieve very high (though not record-breaking) resolution for metal features deposited on the substrate. | ||
==Methods and Results== | ==Methods and Results== | ||
Revision as of 00:55, 19 September 2011
Written by: Grant England AP225 Fall, 2011
Info
Title: Nanometer Patterning with Ice
Authors: King, Gavin M., Gregor Schurmann, Daniel Branton, and Jene A. Golovchenko
@Harvard: http://dash.harvard.edu/bitstream/handle/1/3109370/Branton_NanometerPatterning.pdf?sequence=1
Summary
This paper detailed the use of water ice as a photolithographic material akin to photoresist. By growing layers of ice on a substrate, and using e-beam or FIB to sublimate parts of the ice off, the authors were able to achieve very high (though not record-breaking) resolution for metal features deposited on the substrate.
