Difference between revisions of "Multi-photon lithography"

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''Entry chosen by Grant England''
 
''Entry chosen by Grant England''
  
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Multiphoton lithography involves any process which requires more than one photon for photochemical activation.  Since the reaction (usually [[photopolymerization]] requires more than one photon to be present in the same location in order for it to occur, the probability of this occurring is only large enough near the focal point of a scanning laser beam which is used to three-dimensionally write the material.
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Methods for large area patterning using multiphoton lithography have been developed by using conformal phase masks [http://rogers.matse.illinois.edu/files/2006/optexpr2photon.pdf], but these are currently limited to periodic structures such as 3D [[Photonic Crystals]].
  
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Wikipedia stub: [http://en.wikipedia.org/wiki/Multiphoton_lithography]
  
 
==  Keyword in references: ==
 
==  Keyword in references: ==
  
 
[[Direct Writing and Actuation of Three-Dimensionally Patterned Hydrogel Pads on Micropillar Supports]]
 
[[Direct Writing and Actuation of Three-Dimensionally Patterned Hydrogel Pads on Micropillar Supports]]

Revision as of 16:14, 6 December 2011

Entry chosen by Grant England

Multiphoton lithography involves any process which requires more than one photon for photochemical activation. Since the reaction (usually photopolymerization requires more than one photon to be present in the same location in order for it to occur, the probability of this occurring is only large enough near the focal point of a scanning laser beam which is used to three-dimensionally write the material.

Methods for large area patterning using multiphoton lithography have been developed by using conformal phase masks [1], but these are currently limited to periodic structures such as 3D Photonic Crystals.

Wikipedia stub: [2]

Keyword in references:

Direct Writing and Actuation of Three-Dimensionally Patterned Hydrogel Pads on Micropillar Supports