Low-temperature synthesis of nanoscale silica multilayers – atomic layer deposition in a test tube
Atomic layer deposition, silica multilayer
Tetramethoxysilane vapor is used alternately with ammonia vapor as a catalyst to grow uniform silica multilayers onto hydrophilic surfaces at ambient conditions.
Results and Discussion
Alkoxysilane vapor (tetramethoxysilane, TMOS) has been used for the low temperature growth of silica multilayers, which can be useful when organic materials are to be coated which can't resist high temperature conventional ALD. Here, silica multilayers were deposited isotropically on polymer colloidal spheres and within a colloidal crystal (opal) structure.