Difference between revisions of "Low-temperature synthesis of nanoscale silica multilayers – atomic layer deposition in a test tube"

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== Results and Discussion ==
 
== Results and Discussion ==
[[Image:Hatton 1.jpg|400px|thumb|left|]] [[Image:Hatton 2.jpg|800px|thumb|left|]] [[Image:Hatton 3.jpg|400px|thumb|left|]] [[Image:Hatton 4.jpg|400px|thumb|right|]]
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[[Image:Hatton 1.jpg|400px|thumb|left|]]  
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Alkoxysilane vapor (tetramethoxysilane, TMOS) has been used for the low temperature
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growth of silica multilayers, which can be useful when organic materials are to be coated which can't resist high temperature conventional ALD. Here, silica multilayers were deposited isotropically on polymer colloidal spheres and within a colloidal crystal
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(opal) structure.
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[[Image:Hatton 2.jpg|800px|thumb|left|]] [[Image:Hatton 3.jpg|400px|thumb|left|]] [[Image:Hatton 4.jpg|400px|thumb|right|]]

Revision as of 03:04, 30 November 2010

Birgit Hausmann

Reference

B. Hatton et. al. "Low-temperature synthesis of nanoscale silica multilayers – atomic layer deposition in a test tube”, J. Mater. Chem., (20) 6009–6013 2010

Keywords

Atomic layer deposition, silica multilayer

Overview

Tetramethoxysilane vapor is used alternately with ammonia vapor as a catalyst to grow uniform silica multilayers onto hydrophilic surfaces at ambient conditions.

Results and Discussion

Hatton 1.jpg

Alkoxysilane vapor (tetramethoxysilane, TMOS) has been used for the low temperature growth of silica multilayers, which can be useful when organic materials are to be coated which can't resist high temperature conventional ALD. Here, silica multilayers were deposited isotropically on polymer colloidal spheres and within a colloidal crystal (opal) structure.

Hatton 2.jpg
Hatton 3.jpg
Hatton 4.jpg