Difference between revisions of "Liquids on topologically nano-patterned surfaces"

From Soft-Matter
Jump to: navigation, search
Line 1: Line 1:
"Liquids on Topologically Nanopatterned Surfaces"
+
"Liquids on Topologically Nanopatterned Surfaces"<br>
Oleg Gang, Kyle J. Alvine, Masafumi Fukuto, Peter S. Pershan, Charles T. Black, and Benjamin M. Ocko
+
Oleg Gang, Kyle J. Alvine, Masafumi Fukuto, Peter S. Pershan, Charles T. Black, and Benjamin M. Ocko<br>
 
Physical Review Letters 95(21) 217801 (2005)
 
Physical Review Letters 95(21) 217801 (2005)
 +
 +
== Soft Matter Keywords ==
 +
liquid thin film, wetting, laterally heterogeneous surface
 +
 +
== Summary ==
 +
Gang, et al. present experimental work performed to verify theory on the wetting of thin films.  Working with a nanopatterned silicon surface and a film of methyl-cyclohexane (MCH), the authors should that film thickness has two different power law dependences on chemical potential offset from the bulk liquid-vapor equilibrium.  These two dependences delineate two regimes of film growth.  The first regime is characterized by constant film thickness on the surface and filling of the nanowells, while the second regime is characterized by growth of the surface film after the wells have been completely filled.  The behavior of the film is studied using x-ray reflectivity (XR) and grazing incidence diffraction (GID).

Revision as of 12:27, 24 February 2009

"Liquids on Topologically Nanopatterned Surfaces"
Oleg Gang, Kyle J. Alvine, Masafumi Fukuto, Peter S. Pershan, Charles T. Black, and Benjamin M. Ocko
Physical Review Letters 95(21) 217801 (2005)

Soft Matter Keywords

liquid thin film, wetting, laterally heterogeneous surface

Summary

Gang, et al. present experimental work performed to verify theory on the wetting of thin films. Working with a nanopatterned silicon surface and a film of methyl-cyclohexane (MCH), the authors should that film thickness has two different power law dependences on chemical potential offset from the bulk liquid-vapor equilibrium. These two dependences delineate two regimes of film growth. The first regime is characterized by constant film thickness on the surface and filling of the nanowells, while the second regime is characterized by growth of the surface film after the wells have been completely filled. The behavior of the film is studied using x-ray reflectivity (XR) and grazing incidence diffraction (GID).